Invention Grant
- Patent Title: Combination of a substrate and a wafer
- Patent Title (中): 基板和晶片的组合
-
Application No.: US12916751Application Date: 2010-11-01
-
Publication No.: US08349701B2Publication Date: 2013-01-08
- Inventor: Erich Thallner
- Applicant: Erich Thallner
- Agency: Kusner & Jaffe
- Priority: DE102006000687 20060103
- Main IPC: H01L21/30
- IPC: H01L21/30

Abstract:
The invention pertains to a combination of a substrate (6) and a wafer (15), wherein the substrate (6) and the wafer (15) are arranged parallel to one another and bonded together with the aid of an adhesive layer (8) situated between the substrate (6) and the wafer (15), and wherein the adhesive is chosen such that its adhesive properties are neutralized or at least diminished when a predetermined temperature is exceeded. According to the invention, the adhesive layer (8) is only applied annularly between the substrate (6) and the wafer (15) in the edge region of the wafer (15).
Public/Granted literature
- US20110045240A1 COMBINATION OF A SUBSTRATE AND A WAFER Public/Granted day:2011-02-24
Information query
IPC分类: