Invention Grant
- Patent Title: Method of crystallizing semiconductor film and method of manufacturing semiconductor device
- Patent Title (中): 半导体膜结晶方法及其制造方法
-
Application No.: US11972029Application Date: 2008-01-10
-
Publication No.: US08349714B2Publication Date: 2013-01-08
- Inventor: Koichiro Tanaka , Tomoaki Moriwaka , Takatsugu Omata , Junpei Momo
- Applicant: Koichiro Tanaka , Tomoaki Moriwaka , Takatsugu Omata , Junpei Momo
- Applicant Address: JP Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Kanagawa-ken
- Agency: Nixon Peabody LLP
- Agent Jeffrey L. Costellia
- Priority: JP2007-013868 20070124
- Main IPC: H01L21/268
- IPC: H01L21/268

Abstract:
It is an object of the present invention to align the plane orientations of crystal grains of a semiconductor film crystallized by irradiation with a linear laser beam with a width of less than or equal to 5 μm. By performing irradiation with the linear laser beam condensed by an aspheric cylindrical lens or a gradient index lens to completely melt the semiconductor film and scanning the linear laser beam, the completely melted semiconductor film is made to grow laterally. Because the linear beam is very narrow, the width of the semiconductor which is in a liquid state is also narrow, so the occurrence of turbulent flow in the liquid semiconductor is suppressed. Therefore, growth directions of adjacent crystal grains do not become disordered due to turbulent flow and are unformalized, and thus the plane orientations of the laterally grown crystal grains can be aligned.
Public/Granted literature
- US20080214021A1 METHOD OF CRYSTALLIZING SEMICONDUCTOR FILM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2008-09-04
Information query
IPC分类: