Invention Grant
- Patent Title: Nonvolatile semiconductor memory and manufacturing method thereof
- Patent Title (中): 非易失性半导体存储器及其制造方法
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Application No.: US13415942Application Date: 2012-03-09
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Publication No.: US08349720B2Publication Date: 2013-01-08
- Inventor: Mutsuo Morikado
- Applicant: Mutsuo Morikado
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-231145 20060828
- Main IPC: H01L21/283
- IPC: H01L21/283

Abstract:
A nonvolatile semiconductor memory includes a memory cell string having a plurality of memory cell transistors connected in series, a selection gate transistor connected in series with one end of the memory cell string, and having a gate electrode provided on a gate insulating film on a semiconductor substrate, and an element isolation insulating layer which is provided in the semiconductor substrate. The gate electrode includes a first gate electrode provided on the gate insulating film, a first and second insulating films provided on the first gate electrode, and a second gate electrode provided on the second insulating film and the element isolation insulating layer, and electrically connected to the first gate electrode. An first upper surface portion of the element isolation insulating layer below the second gate electrode is leveled with an upper surface of the first gate electrode.
Public/Granted literature
- US20120171856A1 NONVOLATILE SEMICONDUCTOR MEMORY AND MANUFACTURING METHOD THEREOF Public/Granted day:2012-07-05
Information query
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