Invention Grant
- Patent Title: Manufacturing method of substrate with through electrode
- Patent Title (中): 具有通孔电极的基板的制造方法
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Application No.: US12132187Application Date: 2008-06-03
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Publication No.: US08349733B2Publication Date: 2013-01-08
- Inventor: Takaharu Yamano
- Applicant: Takaharu Yamano
- Applicant Address: JP Nagano-shi, Nagano
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano-shi, Nagano
- Agency: Rankin, Hill & Clark LLP
- Priority: JP2007-148182 20070604
- Main IPC: H01L21/768
- IPC: H01L21/768

Abstract:
A manufacturing method of a substrate with through electrodes, comprising a substrate having through holes, and through electrodes received in the through holes, includes a through electrode formation step of forming the through electrodes on a support plate, a substrate formation step of forming the substrate, a through electrode reception step of stacking the substrate on the support plate 45 and receiving the through electrodes in the through holes, a resin filling step of filling gaps between side surfaces of the through electrodes and inner walls of the through holes of the substrate 11 with a resin, and a support plate removal step of removing the support plate after the resin filling step.
Public/Granted literature
- US20080299768A1 MANUFACTURING METHOD OF SUBSTRATE WITH THROUGH ELECTRODE Public/Granted day:2008-12-04
Information query
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