Invention Grant
- Patent Title: Chain scission polyester polymers for photoresists
- Patent Title (中): 用于光致抗蚀剂的断链聚酯聚合物
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Application No.: US12918647Application Date: 2009-02-20
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Publication No.: US08349990B2Publication Date: 2013-01-08
- Inventor: Robert L. Brainard , Srividya Revuru
- Applicant: Robert L. Brainard , Srividya Revuru
- Applicant Address: US NY Albany
- Assignee: The Research Foundation of State University of New York
- Current Assignee: The Research Foundation of State University of New York
- Current Assignee Address: US NY Albany
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- International Application: PCT/US2009/034707 WO 20090220
- International Announcement: WO2009/105667 WO 20090827
- Main IPC: C08G73/00
- IPC: C08G73/00 ; C08G63/02
Abstract:
Polymers for extreme ultraviolet and 193 nm photoresists are disclosed. The polymers comprise a photoacid generator (PAG) residue, an acid cleavable residue and a diacid joined by ester linkages. The polymers include a photoacid generating diol, a diacid and an acid table diol.
Public/Granted literature
- US20110127651A1 CHAIN SCISSION POLYESTER POLYMERS FOR PHOTORESISTS Public/Granted day:2011-06-02
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