Invention Grant
- Patent Title: Process for producing fluorine-containing compounds
- Patent Title (中): 含氟化合物的制造方法
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Application No.: US12734842Application Date: 2008-11-28
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Publication No.: US08350082B2Publication Date: 2013-01-08
- Inventor: Mitsuo Kurumaya , Tsunetoshi Honda , Kota Omori
- Applicant: Mitsuo Kurumaya , Tsunetoshi Honda , Kota Omori
- Applicant Address: JP Tokyo JP Akita-Shi
- Assignee: Mitsubishi Materials Corporation,Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Current Assignee: Mitsubishi Materials Corporation,Mitsubishi Materials Electronic Chemicals Co., Ltd.
- Current Assignee Address: JP Tokyo JP Akita-Shi
- Agency: Edwards Wildman Palmer LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JP2007-307240 20071128; JP2007-307241 20071128
- International Application: PCT/JP2008/071654 WO 20081128
- International Announcement: WO2009/069750 WO 20090604
- Main IPC: C07C51/58
- IPC: C07C51/58

Abstract:
This process for producing fluorine-containing compounds includes liquid-phase fluorination by introducing a raw material compound and fluorine gas into a solvent to replace hydrogen atoms in the raw material compound with fluorine atoms. More specifically, the process for producing fluorine-containing compounds includes (1) promoting fluorination by dissolving the raw material compound in anhydrous hydrofluoric acid and introducing into a liquid-phase fluorination solvent, or (2) promoting fluorination by dissolving the raw material compound in a perfluoro compound having a plurality of polar groups in a molecule thereof and introducing into a liquid-phase fluorination solvent. According to these processes, a fluorination reaction can be carried out at high yield and without containing hardly any isomers while using a hydrocarbon compound as is for the raw material.
Public/Granted literature
- US20100305345A1 PROCESS FOR PRODUCING FLUORINE-CONTAINING COMPOUNDS Public/Granted day:2010-12-02
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