Invention Grant
US08350244B2 Variable resistance device, method for manufacturing variable resistance device, and semiconductor storage device using variable resistance device 失效
可变电阻器件,可变电阻器件的制造方法以及使用可变电阻器件的半导体存储器件

  • Patent Title: Variable resistance device, method for manufacturing variable resistance device, and semiconductor storage device using variable resistance device
  • Patent Title (中): 可变电阻器件,可变电阻器件的制造方法以及使用可变电阻器件的半导体存储器件
  • Application No.: US12785763
    Application Date: 2010-05-24
  • Publication No.: US08350244B2
    Publication Date: 2013-01-08
  • Inventor: Hideyuki Noshiro
  • Applicant: Hideyuki Noshiro
  • Applicant Address: JP Kawasaki
  • Assignee: Fujitsu Limited
  • Current Assignee: Fujitsu Limited
  • Current Assignee Address: JP Kawasaki
  • Agency: Westerman, Hattori, Daniels & Adrian, LLP
  • Main IPC: H01L29/02
  • IPC: H01L29/02
Variable resistance device, method for manufacturing variable resistance device, and semiconductor storage device using variable resistance device
Abstract:
A variable resistance device includes a first electrode including a transition metal nitride film, a second electrode including a precious metal or a precious metal oxide, and a transition metal oxide film interposed between the first and second electrodes.
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