Invention Grant
US08350296B2 Enhancement mode III-nitride device with floating gate and process for its manufacture 有权
具有浮动栅极的增强型III族氮化物器件及其制造方法

Enhancement mode III-nitride device with floating gate and process for its manufacture
Abstract:
An enhancement mode III-Nitride device has a floating gate spaced from a drain electrode which is programmed by charges injected into the floating gate to form a permanent depletion region which interrupts the 2-DEG layer beneath the floating gate. A conventional gate is formed atop the floating gate and is insulated therefrom by a further dielectric layer. The device is a normally off E mode device and is turned on by applying a positive voltage to the floating gate to modify the depletion layer and reinstate the 2-DEG layer. The device is formed by conventional semiconductor fabrication techniques.
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