Invention Grant
US08350296B2 Enhancement mode III-nitride device with floating gate and process for its manufacture
有权
具有浮动栅极的增强型III族氮化物器件及其制造方法
- Patent Title: Enhancement mode III-nitride device with floating gate and process for its manufacture
- Patent Title (中): 具有浮动栅极的增强型III族氮化物器件及其制造方法
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Application No.: US12195801Application Date: 2008-08-21
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Publication No.: US08350296B2Publication Date: 2013-01-08
- Inventor: Hamid Tony Bahramian
- Applicant: Hamid Tony Bahramian
- Applicant Address: US CA El Segundo
- Assignee: International Rectifier Corporation
- Current Assignee: International Rectifier Corporation
- Current Assignee Address: US CA El Segundo
- Agency: Farjami & Farjami LLP
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
An enhancement mode III-Nitride device has a floating gate spaced from a drain electrode which is programmed by charges injected into the floating gate to form a permanent depletion region which interrupts the 2-DEG layer beneath the floating gate. A conventional gate is formed atop the floating gate and is insulated therefrom by a further dielectric layer. The device is a normally off E mode device and is turned on by applying a positive voltage to the floating gate to modify the depletion layer and reinstate the 2-DEG layer. The device is formed by conventional semiconductor fabrication techniques.
Public/Granted literature
- US20100044751A1 ENHANCEMENT MODE III-NITRIDE DEVICE WITH FLOATING GATE AND PROCESS FOR ITS MANUFACTURE Public/Granted day:2010-02-25
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