Invention Grant
- Patent Title: Nonvolatile semiconductor memory
- Patent Title (中): 非易失性半导体存储器
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Application No.: US13310148Application Date: 2011-12-02
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Publication No.: US08350309B2Publication Date: 2013-01-08
- Inventor: Hiroshi Watanabe , Hiroshi Nakamura , Kazuhiro Shimizu , Seiichi Aritome , Toshitake Yaegashi , Yuji Takeuchi , Kenichi Imamiya , Ken Takeuchi , Hideko Oodaira
- Applicant: Hiroshi Watanabe , Hiroshi Nakamura , Kazuhiro Shimizu , Seiichi Aritome , Toshitake Yaegashi , Yuji Takeuchi , Kenichi Imamiya , Ken Takeuchi , Hideko Oodaira
- Applicant Address: JP Kawasaki-shi
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Kawasaki-shi
- Agency: Banner & Witcoff, Ltd.
- Priority: JP10-084379 19980330; JP10-258778 19980911
- Main IPC: H01L27/108
- IPC: H01L27/108 ; H01L29/73

Abstract:
A select gate transistor has a select gate electrode composed of a first-level conductive layer and a second-level conductive layer. The first-level conductive layer has contact areas. The second-level conductive layer has its portions removed that are located above the contact areas. Two adjacent select gate electrodes that are adjacent to each other in the column direction are arranged such that the contact areas of one select gate electrode are not opposed to the contact areas of the other select gate electrode. One select gate electrode has its first- and second-level conductive layers removed in their portions that are opposed to the contact areas of the other select gate electrode.
Public/Granted literature
- US20120075903A1 Nonvolatile Semiconductor Memory Public/Granted day:2012-03-29
Information query
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