Invention Grant
US08350343B2 Field effect transistor with channel region edge and center portions having different band structures for suppressed corner leakage
有权
场效应晶体管,沟道区域边缘和中心部分具有不同的带结构,用于抑制拐角泄漏
- Patent Title: Field effect transistor with channel region edge and center portions having different band structures for suppressed corner leakage
- Patent Title (中): 场效应晶体管,沟道区域边缘和中心部分具有不同的带结构,用于抑制拐角泄漏
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Application No.: US13362019Application Date: 2012-01-31
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Publication No.: US08350343B2Publication Date: 2013-01-08
- Inventor: Brent A. Anderson , Edward J. Nowak
- Applicant: Brent A. Anderson , Edward J. Nowak
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: GIbb & Riley, LLC
- Agent Anthony J. Canale
- Main IPC: H01L29/76
- IPC: H01L29/76

Abstract:
Disclosed are embodiments of field effect transistors (FETs) having suppressed sub-threshold corner leakage, as a function of channel material band-edge modulation. Specifically, the FET channel region is formed with different materials at the edges as compared to the center. Different materials with different band structures and specific locations of those materials are selected in order to effectively raise the threshold voltage (Vt) at the edges of the channel region relative to the Vt at the center of the channel region and, thereby to suppress of sub-threshold corner leakage. Also disclosed are design structures for such FETs and method embodiments for forming such FETs.
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