Invention Grant
- Patent Title: Magnetic memory devices and methods of forming the same
- Patent Title (中): 磁记忆装置及其形成方法
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Application No.: US13417402Application Date: 2012-03-12
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Publication No.: US08350348B2Publication Date: 2013-01-08
- Inventor: KyungTae Nam , Byeungchul Kim , Seung-Yeol Lee
- Applicant: KyungTae Nam , Byeungchul Kim , Seung-Yeol Lee
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Myers Bigel Sibley & Sajovec
- Priority: KR10-2010-0024334 20100318
- Main IPC: H01L29/82
- IPC: H01L29/82

Abstract:
Provided are a magnetic memory device and a method of forming the same. The method may include forming a pinning pattern on a substrate; forming a first interlayer insulating layer that exposes the pinning pattern on the substrate; forming a pinned layer, a tunneling barrier layer and a second magnetic conductive layer on the pinning pattern; and forming a pinned pattern, a tunnel barrier pattern and a second magnetic conductive pattern by performing a patterning process on the pinned layer, the tunnel barrier layer and the second magnetic conductive layer.
Public/Granted literature
- US20120168887A1 Magnetic Memory Devices and Methods of Forming the Same Public/Granted day:2012-07-05
Information query
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