Invention Grant
- Patent Title: Electrostatic discharge devices
- Patent Title (中): 静电放电装置
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Application No.: US12714985Application Date: 2010-03-01
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Publication No.: US08350355B2Publication Date: 2013-01-08
- Inventor: Kai Esmark
- Applicant: Kai Esmark
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
Electrostatic discharge devices and methods of forming thereof are disclosed. In one embodiment, a semiconductor device includes an electrostatic discharge (ESD) device region disposed within a semiconductor body. A first ESD device is disposed in a first region of the ESD device region, and a second ESD device disposed in a second region of the ESD device region. The second region is separated from the first region by a first trench.
Public/Granted literature
- US20110210418A1 Electrostatic Discharge Devices Public/Granted day:2011-09-01
Information query
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