Invention Grant
- Patent Title: Power semiconductor element with two-stage impurity concentration profile
- Patent Title (中): 功率半导体元件具有两级杂质浓度分布
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Application No.: US13164643Application Date: 2011-06-20
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Publication No.: US08350366B2Publication Date: 2013-01-08
- Inventor: Bernhard Koenig
- Applicant: Bernhard Koenig
- Applicant Address: DE Nürnberg
- Assignee: Semikron Elektronik GmbH & Co., KG
- Current Assignee: Semikron Elektronik GmbH & Co., KG
- Current Assignee Address: DE Nürnberg
- Agency: The Law Offices of Roger S. Thompson
- Priority: DE102010024257 20100618
- Main IPC: H01L29/36
- IPC: H01L29/36

Abstract:
A power semiconductor component having a pn junction, a body with a first basic conductivity, a well-like region with a second conductivity which is arranged horizontally centrally in the body, has a first two-level doping profile and has a first penetration depth from the first main surface into the body. In addition, this power semiconductor component has an edge structure which is arranged between the well-like region and the edge of the power semiconductor component and which comprises a plurality of field rings with a single-level doping profile, a second conductivity and a second penetration depth, wherein the first penetration depth is no more than about 50% of the second penetration depth.
Public/Granted literature
- US20120007223A1 Power Semiconductor Element With Two-Stage Impurity Concentration Profile Public/Granted day:2012-01-12
Information query
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