Invention Grant
- Patent Title: Semiconductor device and method of forming shielding layer after encapsulation and grounded through interconnect structure
- Patent Title (中): 半导体器件和封装后形成屏蔽层的方法,并通过互连结构接地
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Application No.: US13209620Application Date: 2011-08-15
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Publication No.: US08350368B2Publication Date: 2013-01-08
- Inventor: HeeJo Chi , NamJu Cho , HanGil Shin
- Applicant: HeeJo Chi , NamJu Cho , HanGil Shin
- Applicant Address: SG Singapore
- Assignee: STATS ChipPAC, Ltd.
- Current Assignee: STATS ChipPAC, Ltd.
- Current Assignee Address: SG Singapore
- Agency: Patent Law Group: Atkins & Associate, P.C.
- Agent Robert D. Atkins
- Main IPC: H01L21/56
- IPC: H01L21/56 ; H01L23/552

Abstract:
A method of manufacturing a semiconductor device includes providing a substrate having a conductive bump formed over the substrate and a semiconductor die with an active surface oriented to the substrate. An encapsulant is deposited over the semiconductor die and the conductive bump, and the encapsulant is planarized to expose a back surface of the semiconductor die opposite the active surface while leaving the encapsulant covering the conductive bump. A channel is formed into the encapsulant to expose the conductive bump. The channel extends vertically from a surface of the encapsulant down through the encapsulant and into a portion of the conductive bump. The channel extends through the encapsulant horizontally along a length of the semiconductor die. A shielding layer is formed over the encapsulant and the back surface of the semiconductor die. The shielding layer includes a docking pin extending into the channel and into the portion of the conductive bump to electrically connect to the conductive bump and provide isolation from inter-device interference.
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