Invention Grant
US08350368B2 Semiconductor device and method of forming shielding layer after encapsulation and grounded through interconnect structure 有权
半导体器件和封装后形成屏蔽层的方法,并通过互连结构接地

Semiconductor device and method of forming shielding layer after encapsulation and grounded through interconnect structure
Abstract:
A method of manufacturing a semiconductor device includes providing a substrate having a conductive bump formed over the substrate and a semiconductor die with an active surface oriented to the substrate. An encapsulant is deposited over the semiconductor die and the conductive bump, and the encapsulant is planarized to expose a back surface of the semiconductor die opposite the active surface while leaving the encapsulant covering the conductive bump. A channel is formed into the encapsulant to expose the conductive bump. The channel extends vertically from a surface of the encapsulant down through the encapsulant and into a portion of the conductive bump. The channel extends through the encapsulant horizontally along a length of the semiconductor die. A shielding layer is formed over the encapsulant and the back surface of the semiconductor die. The shielding layer includes a docking pin extending into the channel and into the portion of the conductive bump to electrically connect to the conductive bump and provide isolation from inter-device interference.
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