Invention Grant
US08351024B2 Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments
有权
涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法
- Patent Title: Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments
- Patent Title (中): 涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法
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Application No.: US12722924Application Date: 2010-03-12
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Publication No.: US08351024B2Publication Date: 2013-01-08
- Inventor: Arie Jeffrey Den Boef
- Applicant: Arie Jeffrey Den Boef
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/58
- IPC: G03B27/58

Abstract:
A level sensor configured to determine a height level of a substrate is disclosed. The level sensor includes a projection unit to project a measurement beam having a substantially periodic radiation intensity on the substrate; a detection unit to receive the measurement beam after reflection on the substrate, the detection unit having a detection grating arranged to receive the reflected measurement beam, the detection grating comprising at least one array of three or more segments together having a length substantially equal to a length of a period of the measurement beam projected on the detection grating, and configured to split the reflected measurement beam in three or more reflected measurement beam parts, and three or more detectors each arranged to receive one of the three or more measurement beam parts; and a processing unit to calculate a height level on the basis of the measurement beam parts.
Public/Granted literature
- US20100231889A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-09-16
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