Invention Grant
- Patent Title: Optical device having extented depth of field and fabrication method thereof
- Patent Title (中): 具有扩展景深的光学装置及其制造方法
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Application No.: US12882623Application Date: 2010-09-15
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Publication No.: US08351120B2Publication Date: 2013-01-08
- Inventor: Jau-Jan Deng , Yu-Shu Kao , Yun-Chiang Hsu
- Applicant: Jau-Jan Deng , Yu-Shu Kao , Yun-Chiang Hsu
- Applicant Address: TW Hsinchu US CA Santa Clara
- Assignee: VisEra Technologies Company Limited,OmniVision Technologies, Inc.
- Current Assignee: VisEra Technologies Company Limited,OmniVision Technologies, Inc.
- Current Assignee Address: TW Hsinchu US CA Santa Clara
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Main IPC: G02B27/10
- IPC: G02B27/10

Abstract:
A method for designing an optical device which includes a lens and a microlens array is disclosed. A point spread function (PSF) of the lens including rotationally symmetrical aberration coefficients is formulated, wherein the PSF presents various spherical spot sizes. A virtual phase mask having phase coefficients is provided and the phase coefficients are added to the PSF of the lens, such that the various spherical spot sizes are homogenized. The virtual phase mask is transformed into a polynomial function comprising high and low order aberration coefficients. A surface contour of the lens is determined according to the rotationally symmetrical aberration coefficients and the low order aberration coefficients, and a sag height of each microlens in the microlens array is determined according to the high order aberration coefficients. An optical device using the design method is also disclosed.
Public/Granted literature
- US20120062997A1 OPTICAL DEVICE HAVING EXTENTED DEPTH OF FIELD AND FABRICATION METHOD THEREOF Public/Granted day:2012-03-15
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