Invention Grant
- Patent Title: Multiple energy X-ray source
- Patent Title (中): 多能量X射线源
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Application No.: US12866745Application Date: 2009-02-10
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Publication No.: US08351575B2Publication Date: 2013-01-08
- Inventor: Gereon Vogtmeier
- Applicant: Gereon Vogtmeier
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP08101670 20080215
- International Application: PCT/IB2009/050542 WO 20090210
- International Announcement: WO2009/101576 WO 20090820
- Main IPC: H01J35/00
- IPC: H01J35/00

Abstract:
A source (19) for multiple energy X-ray generation in particular by field emitting carbon nanotubes (1, 2) is presented. In order to achieve a spatial overlap of the trajectories of the X-ray beams coming from different emitters, a focusing unit (7, 9) is supplied to the emitted electrons (28, 29). A fast switching between the emission of the different carbon nanotubes allows multiple kilovolt imaging. Independent determination of multiple focal spot parameters by the focusing unit leads to the possibilities of fast switching between different spot geometries and spatial resolutions. This might be seen in FIG. 1.
Public/Granted literature
- US20110007874A1 MULTIPLE ENERGY X-RAY SOURCE Public/Granted day:2011-01-13
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