Invention Grant
- Patent Title: Inspection apparatus and inspection method
- Patent Title (中): 检验仪器和检验方法
-
Application No.: US12338528Application Date: 2008-12-18
-
Publication No.: US08351683B2Publication Date: 2013-01-08
- Inventor: Hiroyuki Yamashita , Norio Sakaiya , Kei Shimura , Masaaki Ito
- Applicant: Hiroyuki Yamashita , Norio Sakaiya , Kei Shimura , Masaaki Ito
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-331316 20071225; JP2008-062840 20080312
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G06T11/20

Abstract:
The invention is directed to find a false defect from defect candidates and obtain a threshold with which the false defect can be eliminated by the smallest number of review times. Defect candidates are reviewed and selected as a defect or a false defect. By deleting a defect candidate having a characteristic quantity equal to or less than that of the false defect from a map or displaying it in another sign, the false defect can be determined visually. Since the defect candidate having the characteristic quantity equal to or less than that of the selected false defect is deleted from the map or displayed in another sign, the defect candidates unnecessary to set a threshold are not reviewed. The number of defect candidates to be reviewed can be largely reduced as compared with that in the conventional technique. Further, by repeating the above work, the threshold is automatically calculated, and an inspection result map with the threshold is displayed, so that a re-inspection is unnecessary.
Public/Granted literature
- US20090161943A1 INSPECTION APPARATUS AND INSPECTION METHOD Public/Granted day:2009-06-25
Information query