Invention Grant
US08352886B2 Method for the reproducible determination of the position of structures on a mask with a pellicle frame
有权
用于在具有防护薄膜组件框架的掩模上重新确定结构位置的方法
- Patent Title: Method for the reproducible determination of the position of structures on a mask with a pellicle frame
- Patent Title (中): 用于在具有防护薄膜组件框架的掩模上重新确定结构位置的方法
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Application No.: US13030665Application Date: 2011-02-18
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Publication No.: US08352886B2Publication Date: 2013-01-08
- Inventor: Frank Laske , Christian Enkrich , Eric Cotte
- Applicant: Frank Laske , Christian Enkrich , Eric Cotte
- Applicant Address: DE Weilburg
- Assignee: KLA-Tencor MIE GmbH
- Current Assignee: KLA-Tencor MIE GmbH
- Current Assignee Address: DE Weilburg
- Agency: Patentbar International, P.C.
- Priority: DE102010015884 20100309
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06G11/22 ; G03F1/00

Abstract:
A method for the reproducible determination of the positions of structures (3) on a mask (2) is disclosed. A pellicle frame (30) is firmly attached to the mask (2). A theoretical model of the bending of the mask (2) with the firmly attached pellicle frame (30) is calculated, wherein material properties of the mask (2), of the pellicle frame (30), and of the attaching means between the pellicle frame (30) and the mask (2) are taken into account in the calculation of the bending of the mask (2). For the calculation of the bending of the mask (2) its contact with three support points is considered. The positions of the structures (3) on the mask (2) are measured with a metrology tool (1). The measured positions of each structure are corrected with the theoretical model of the bending of the mask at the position of the respectively measured structure.
Public/Granted literature
- US20110225554A1 Method for the Reproducible Determination of the Position of Structures on a Mask with a Pellicle Frame Public/Granted day:2011-09-15
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