Invention Grant
- Patent Title: Layout decomposition based on partial intensity distribution
- Patent Title (中): 基于部分强度分布的布局分解
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Application No.: US12859743Application Date: 2010-08-19
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Publication No.: US08352891B2Publication Date: 2013-01-08
- Inventor: Christopher E Reid , George P Lippincott , Sergiy M Komirenko
- Applicant: Christopher E Reid , George P Lippincott , Sergiy M Komirenko
- Applicant Address: US OR Wilsonville
- Assignee: Mentor Graphics Corporation
- Current Assignee: Mentor Graphics Corporation
- Current Assignee Address: US OR Wilsonville
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G06F19/00 ; G03F1/00 ; G21K5/00
Abstract:
Layout design data are decomposed for double dipole lithography based on partial intensity distribution information. The partial intensity distribution information is generated by performing optical simulations on the layout design data. The layout decomposition may further be adjusted during an optical proximity correction process. The adjustment may utilize the partial intensity distribution information.
Public/Granted literature
- US20120047473A1 Layout Decomposition Based on Partial Intensity Distribution Public/Granted day:2012-02-23
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