发明授权
US08354206B2 Method of generating photomask data, method of fabricating photomask, non-transitory memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array
有权
产生光掩模数据的方法，制造光掩模的方法，用于生成光掩模数据的非暂态存储介质存储程序，制造具有微透镜阵列的固态图像传感器的方法和制造微透镜阵列的方法
- 专利标题： Method of generating photomask data, method of fabricating photomask, non-transitory memory medium storing program for generating photomask data, method of manufacturing solid-state image sensor having microlens array and method of manufacturing microlens array
- 专利标题（中）： 产生光掩模数据的方法，制造光掩模的方法，用于生成光掩模数据的非暂态存储介质存储程序，制造具有微透镜阵列的固态图像传感器的方法和制造微透镜阵列的方法
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申请号： US12980460申请日： 2010-12-29
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公开(公告)号： US08354206B2公开(公告)日： 2013-01-15
- 发明人: Masaki Kurihara , Kyouhei Watanabe , Shingo Kitamura
- 申请人： Masaki Kurihara , Kyouhei Watanabe , Shingo Kitamura
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2010-002375 20100107; JP2010-282401 20101217
- 主分类号： G03F1/36
- IPC分类号： G03F1/36 ; G03F1/70 ; G03F7/20 ; G03F7/26 ; G06F17/50
摘要：
A method of generating photomask data for fabricating a microlens array, the photomask having a microlens pattern including light-shielding portions and non-light-shielding portions, a rectangular region including a surrounding region having four sides of the rectangular region as outer edges and a primary region having boundaries that are inner edges of the surrounding region, the surrounding region being configured by four strip regions each including one of the four sides as its part, and a width between each outer edge and each corresponding inner edge being not more than 1/2 of a wavelength of exposure light. The method includes determining a layout of light-shielding portions and non-light-shielding portions in the surrounding region so that a density of light-shielding portions is set to fall within a range from 0% to 15%.
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