- 专利标题： Resist ink and method of forming pattern using the same
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申请号： US12612809申请日： 2009-11-05
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公开(公告)号： US08354220B2公开(公告)日： 2013-01-15
- 发明人: Sung-Hee Kim , Byung-Geol Kim
- 申请人： Sung-Hee Kim , Byung-Geol Kim
- 申请人地址： KR Seoul
- 专利权人： LG Display Co., Ltd.
- 当前专利权人： LG Display Co., Ltd.
- 当前专利权人地址： KR Seoul
- 代理机构： Morgan, Lewis & Bockius LLP
- 优先权： KR10-2008-0110626 20081107
- 主分类号： G03F7/26
- IPC分类号： G03F7/26
摘要：
Disclosed is a resist ink having superior acid-resistance and coupling property, the resist ink composed of 70% or less by weight of solvent, 10-15% by weight of base polymer, 10-15% by weight of tacktifier, 3% or less by weight of additive, and 1-10% by weight of coupling agent.
公开/授权文献
- US20100119971A1 RESIST INK AND METHOD OF FORMING PATTERN USING THE SAME 公开/授权日：2010-05-13
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