发明授权
- 专利标题： Cylindrical magnetic levitation stage
- 专利标题（中）： 圆柱磁悬浮台
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申请号： US13001752申请日： 2008-09-29
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公开(公告)号： US08354908B2公开(公告)日： 2013-01-15
- 发明人: Jeong Woo Jeon , Hyun Seok Oh , Sung Il Chung , Yeon Ho Jeong , Do Hyun Kang , S. A. Nikiforov , Mitica Caraiani
- 申请人： Jeong Woo Jeon , Hyun Seok Oh , Sung Il Chung , Yeon Ho Jeong , Do Hyun Kang , S. A. Nikiforov , Mitica Caraiani
- 申请人地址： KR Gyeongsangnam-do
- 专利权人： Korea Electrotechnology Research Institute
- 当前专利权人： Korea Electrotechnology Research Institute
- 当前专利权人地址： KR Gyeongsangnam-do
- 代理机构： Frommer Lawrence & Haug LLP
- 代理商 Ronald R. Santucci
- 优先权： KR10-2008-0065102 20080704
- 国际申请： PCT/KR2008/005733 WO 20080929
- 国际公布： WO2010/002071 WO 20100107
- 主分类号： H01F7/00
- IPC分类号： H01F7/00
摘要：
The present invention provides a cylindrical magnetic levitation stage which includes a cylindrical substrate used to form micro-patterns of various arbitrary shapes on a large-area semiconductor substrate or display panel substrate, a cylindrical substrate, a combination of a first permanent magnet array and a first coil array and a combination of a first permanent magnet array and a first coil array, which are coupled to the cylindrical substrate, so that levitation, axial translation and rotation of the cylindrical substrate can be made finely through the control of a magnetic force generated by the interaction between a magnetic field generated by electric current applied to the coil arrays and a magnetic field generated from the permanent magnet arrays corresponding to the coil arrays.
公开/授权文献
- US20110234343A1 Cylindrical Magnetic Levitation Stage 公开/授权日：2011-09-29
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