发明授权
US08356261B1 Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)
有权
确定用于加速源掩码优化（SMO）的设计规则优化的图像对数斜率的梯度和粗糙度
- 专利标题： Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)
- 专利标题（中）： 确定用于加速源掩码优化（SMO）的设计规则优化的图像对数斜率的梯度和粗糙度
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申请号： US12830258申请日： 2010-07-02
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公开(公告)号： US08356261B1公开(公告)日： 2013-01-15
- 发明人: Robert John Socha
- 申请人： Robert John Socha
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G06F17/50
- IPC分类号： G06F17/50
摘要：
The Hessian (second derivative) of the image log slope (ILS) can be quickly and accurately calculated without the need to use approximate methods from the gradient of the ILS with respect to mask transmission and source intensity. The Hessian has been traditionally calculated using a finite-difference approach. Calculating the Hessian through a finite-difference approach is slow and is an approximate method. The gradient of the ILS improves the speed of calculation of the Hessian, and thus accelerated SMO operation is realized. The results of ILS evaluation can be used in design for manufacturing (DFM) to suggest changes in the design rules to improve imaging. For a fixed illumination, this information can help remove forbidden pitches and help select design rules for 1-D and 2-D patterns on a mask design layout.
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