发明授权
- 专利标题： Method for manufacturing antenna and method for manufacturing semiconductor device
- 专利标题（中）： 制造天线的方法及制造半导体器件的方法
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申请号： US13196133申请日： 2011-08-02
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公开(公告)号： US08357598B2公开(公告)日： 2013-01-22
- 发明人: Tomoyuki Aoki , Daiki Yamada
- 申请人： Tomoyuki Aoki , Daiki Yamada
- 申请人地址： JP Atsugi-shi, Kanagawa-ken
- 专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人： Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址： JP Atsugi-shi, Kanagawa-ken
- 代理机构： Robinson Intellectual Property Law Office, P.C.
- 代理商 Eric J. Robinson
- 优先权： JP2005-158462 20050531
- 主分类号： H01L21/20
- IPC分类号： H01L21/20 ; H01L21/36
摘要：
The present invention provides an antenna with low resistance and a semiconductor device having an antenna whose communication distance is improved. A fluid containing conductive particles is applied over an object. After curing the fluid containing the conductive particles, the fluid is irradiated with a laser to form an antenna. As a method for applying the fluid containing the conductive particles, screen printing, spin coating, dipping, or a droplet discharging method is used. Further, a solid laser having a wavelength of 1 nm or more and 380 nm or less is used as the laser.
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