发明授权
- 专利标题: Pattern inspection device and method of inspecting pattern
- 专利标题(中): 图案检查装置及检验方式
-
申请号: US12477666申请日: 2009-06-03
-
公开(公告)号: US08358340B2公开(公告)日: 2013-01-22
- 发明人: Ryoji Yoshikawa , Tomohide Watanabe , Hiromu Inoue , Hiroyuki Ikeda , Hiroyuki Tanizaki
- 申请人: Ryoji Yoshikawa , Tomohide Watanabe , Hiromu Inoue , Hiroyuki Ikeda , Hiroyuki Tanizaki
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权: JP2008-146871 20080604
- 主分类号: H04N7/18
- IPC分类号: H04N7/18 ; H04N9/47
摘要:
A pattern inspection device according to the embodiment, includes: an image picking-up portion for picking-up an image of a pattern formation member in which a plurality of opening patterns are formed so as to obtain a picked-up image of the pattern formation member; a reference image obtaining portion for obtaining a reference image used for comparing with the picked-up image; and a pattern defect detecting portion for matching the center locations of the opening pattern images respectively between the picked-up image and the reference image, forming difference images of the opening pattern images between the picked-up image and the reference image per the opening pattern and detecting the defect of the opening pattern base on the difference images.