Invention Grant
- Patent Title: Non-volatile semiconductor storage device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US13439213Application Date: 2012-04-04
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Publication No.: US08358539B2Publication Date: 2013-01-22
- Inventor: Takashi Maeda
- Applicant: Takashi Maeda
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-212330 20090914
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
At least some of the memory transistors included in a first memory string are commonly connected to first conductive layers that are connected to at least some of the memory transistors included in a second memory string connected to the same third and fourth conductive layers as the first memory string. At least one of either the memory transistors or the back-gate transistor in the first memory string and at least one of either the memory transistors or the back-gate transistor in the second memory string are connected to the independent first or fifth conductive layers, respectively.
Public/Granted literature
- US20120187466A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE Public/Granted day:2012-07-26
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