发明授权
- 专利标题: Resist protective coating composition and patterning process
- 专利标题(中): 抗蚀保护涂料组合物和图案化工艺
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申请号: US12628705申请日: 2009-12-01
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公开(公告)号: US08361703B2公开(公告)日: 2013-01-29
- 发明人: Yuji Harada , Jun Hatakeyama , Koji Hasegawa
- 申请人: Yuji Harada , Jun Hatakeyama , Koji Hasegawa
- 申请人地址: JP Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: JP2008-307188 20081202
- 主分类号: G03F7/11
- IPC分类号: G03F7/11 ; G03F7/20 ; G03F7/30
摘要:
A protective coating composition comprising a polymer of acyl-protected hexafluoroalcohol structure as a base polymer, optionally in admixture with a second polymer containing sulfonic acid amine salt in recurring units is applied onto a resist film. The protective coating is transparent to radiation of wavelength up to 200 nm.
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