发明授权
US08361878B2 Method for preparing cerium oxide, cerium oxide prepared therefrom and CMP slurry comprising the same
有权
制备氧化铈的方法,由其制备的氧化铈和包含该氧化铈的CMP浆料
- 专利标题: Method for preparing cerium oxide, cerium oxide prepared therefrom and CMP slurry comprising the same
- 专利标题(中): 制备氧化铈的方法,由其制备的氧化铈和包含该氧化铈的CMP浆料
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申请号: US12933659申请日: 2009-03-18
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公开(公告)号: US08361878B2公开(公告)日: 2013-01-29
- 发明人: Sang-Soon Choi , Myoung-hwan Oh , Seung-Beom Cho
- 申请人: Sang-Soon Choi , Myoung-hwan Oh , Seung-Beom Cho
- 申请人地址: KR Seoul
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: Rothwell, Figg, Ernst & Manbeck, P.C.
- 优先权: KR10-2008-0026011 20080320; KR10-2009-0017964 20090303
- 国际申请: PCT/KR2009/001384 WO 20090318
- 国际公布: WO2009/116807 WO 20090924
- 主分类号: H01L21/304
- IPC分类号: H01L21/304
摘要:
The present invention relates to a method for preparing cerium oxide which enables preparation of cerium oxide showing improved polishing performance, cerium oxide prepared therefrom, and CMP slurry comprising the same.The method for preparing cerium oxide comprises the step of contacting cerium oxide with primary alcohol to increase specific surface area of the cerium oxide 10% or more.
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