Invention Grant
- Patent Title: Radiation pattern control
- Patent Title (中): 辐射模式控制
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Application No.: US12449631Application Date: 2007-02-28
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Publication No.: US08362957B2Publication Date: 2013-01-29
- Inventor: Antero Lehtola , Aimo Arkko
- Applicant: Antero Lehtola , Aimo Arkko
- Applicant Address: FI Espoo
- Assignee: Nokia Corporation
- Current Assignee: Nokia Corporation
- Current Assignee Address: FI Espoo
- Agency: Harrington & Smith
- International Application: PCT/IB2007/001678 WO 20070228
- International Announcement: WO2008/104826 WO 20080904
- Main IPC: H01Q1/38
- IPC: H01Q1/38
Abstract:
An apparatus including: a first antenna element; a second antenna element; a ground plane element for at least one of the first and second antenna elements; a first choke arranged to affect a first maximum of current density produced in the ground plane element by the first antenna element; and a second choke arranged to affect a second maximum of current density produced in the ground plane element by the second antenna element.
Public/Granted literature
- US20100315293A1 RADIATION PATTERN CONTROL Public/Granted day:2010-12-16
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