Invention Grant
- Patent Title: Lateral shift measurement using an optical technique
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Application No.: US12775883Application Date: 2010-05-07
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Publication No.: US08363219B2Publication Date: 2013-01-29
- Inventor: Boaz Brill , Moshe Finarov , David Schiener
- Applicant: Boaz Brill , Moshe Finarov , David Schiener
- Applicant Address: IL Rehovoth
- Assignee: Nova Measuring Instruments Ltd.
- Current Assignee: Nova Measuring Instruments Ltd.
- Current Assignee Address: IL Rehovoth
- Agency: Browdy and Neimark, PLLC
- Priority: IL138552 20000919
- Main IPC: G01B11/00
- IPC: G01B11/00 ; H01L23/544 ; H01L21/76

Abstract:
Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
Public/Granted literature
- US20100214566A1 LATERAL SHIFT MEASUREMENT USING AN OPTICAL TECHNIQUE Public/Granted day:2010-08-26
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