发明授权
US08363481B2 Non-volatile semiconductor memory device and method of making the same
失效
非易失性半导体存储器件及其制造方法
- 专利标题: Non-volatile semiconductor memory device and method of making the same
- 专利标题(中): 非易失性半导体存储器件及其制造方法
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申请号: US12521997申请日: 2008-01-31
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公开(公告)号: US08363481B2公开(公告)日: 2013-01-29
- 发明人: Masaru Kidoh , Hiroyasu Tanaka , Masaru Kito , Ryota Katsumata , Hideaki Aochi , Mitsuru Sato
- 申请人: Masaru Kidoh , Hiroyasu Tanaka , Masaru Kito , Ryota Katsumata , Hideaki Aochi , Mitsuru Sato
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: JP2007-026168 20070205
- 国际申请: PCT/JP2008/051999 WO 20080131
- 国际公布: WO2008/096802 WO 20080814
- 主分类号: G11C16/06
- IPC分类号: G11C16/06
摘要:
A non-volatile semiconductor memory device according to the present invention includes a substrate; a first word-line provided above the substrate surface, the first word-line having a plate shape in an area where a memory cell is formed; a second word-line provided above the first word-line surface, the second word-line having a plate shape; a plurality of metal wirings connecting the first and second word-lines with a driver circuit; and a plurality of contacts connecting the first and second word-lines with the metal wirings. The contact of the first word-line is formed in a first word-line contact area. The contact of the second word-line is formed in a second word-line contact area. The first word-line contact area is provided on a surface of the first word-line that is drawn to the second word-line contact area.
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