Invention Grant
- Patent Title: Image sensing device and fabrication thereof
- Patent Title (中): 图像感测装置及其制造
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Application No.: US12898419Application Date: 2010-10-05
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Publication No.: US08368160B2Publication Date: 2013-02-05
- Inventor: Chung-Wei Chang , Fang-Ming Huang , Chi-Shao Lin , Yu-Ping Hu
- Applicant: Chung-Wei Chang , Fang-Ming Huang , Chi-Shao Lin , Yu-Ping Hu
- Applicant Address: KY Grand Cayman
- Assignee: Himax Imaging, Inc.
- Current Assignee: Himax Imaging, Inc.
- Current Assignee Address: KY Grand Cayman
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L31/042
- IPC: H01L31/042

Abstract:
An image sensing device is disclosed, including an epitaxy layer having the a conductivity type, including a first pixel area corresponding to a first incident light, a second pixel area corresponding to a second incident light, and a third pixel area corresponding to a third incident light, wherein the wavelength of the first incident light is longer than that of the second incident light and the wavelength of the second incident light is longer than that of the third incident light. A photodiode is disposed in an upper portion of the epitaxy layer, and a first deep well for reducing pixel-to-pixel talk of the image sensing device is disposed in a lower portion of the epitaxy layer in the second pixel area and the third pixel area, wherein at least a portion of the epitaxy layer in first pixel area does not include the first deep well.
Public/Granted literature
- US20120080766A1 Image Sensing Device and Fabrication Thereof Public/Granted day:2012-04-05
Information query
IPC分类: