- 专利标题: Method and system of improved uniformity testing
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申请号: US12957354申请日: 2010-11-30
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公开(公告)号: US08370096B2公开(公告)日: 2013-02-05
- 发明人: Charlene Chen , Tony P. Chiang , Chi-I Lang , Yun Wang
- 申请人: Charlene Chen , Tony P. Chiang , Chi-I Lang , Yun Wang
- 申请人地址: US CA San Jose
- 专利权人: Intermolecular, Inc.
- 当前专利权人: Intermolecular, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: G06F19/00
- IPC分类号: G06F19/00
摘要:
A method and system includes a first substrate and a second substrate, each substrate comprising a predetermined baseline transmittance value at a predetermine wavelength of light, processing regions on the first substrate by combinatorially varying at least one of materials, process conditions, unit processes, and process sequences associated with the graphene production, performing a first characterization test on the processed regions on the first substrate to generate first results, processing regions on a second substrate in a combinatorial manner by varying at least one of materials, process conditions, unit processes, and process sequences associated with the graphene production based on the first results of the first characterization test, performing a second characterization test on the processed regions on the second substrate to generate second results, and determining whether at least one of the first substrate and the second substrate meet a predetermined quality threshold based on the second results.
公开/授权文献
- US20120136601A1 Method and System of Improved Uniformity Testing 公开/授权日:2012-05-31
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