Invention Grant
US08372742B2 Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design
有权
用于调整集成电路设计的局部和全局图案密度的方法,系统和装置
- Patent Title: Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design
- Patent Title (中): 用于调整集成电路设计的局部和全局图案密度的方法,系统和装置
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Application No.: US12712665Application Date: 2010-02-25
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Publication No.: US08372742B2Publication Date: 2013-02-12
- Inventor: Ying-Chou Cheng , Cheng-Lung Stanley Tsai , Tsong-Hua Ou , Cheng Kun Tsai , Ru-Gun Liu , Wen-Chun Huang
- Applicant: Ying-Chou Cheng , Cheng-Lung Stanley Tsai , Tsong-Hua Ou , Cheng Kun Tsai , Ru-Gun Liu , Wen-Chun Huang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Haynes and Boone, LLP
- Main IPC: H01L21/82
- IPC: H01L21/82

Abstract:
An integrated circuit (IC) design method providing a circuit design layout having a plurality of functional blocks disposed a distance away from each other; identifying a local pattern density to an approximate dummy region, on the circuit design layout, within a predefined distance to one of the functional blocks; performing a local dummy insertion to the approximate dummy region according to the local pattern density; repeating the identifying and performing to at least some other of the functional blocks; and implementing a global dummy insertion to a non-local dummy region according to a global pattern density.
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