Invention Grant
US08372742B2 Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design 有权
用于调整集成电路设计的局部和全局图案密度的方法,系统和装置

Method, system, and apparatus for adjusting local and global pattern density of an integrated circuit design
Abstract:
An integrated circuit (IC) design method providing a circuit design layout having a plurality of functional blocks disposed a distance away from each other; identifying a local pattern density to an approximate dummy region, on the circuit design layout, within a predefined distance to one of the functional blocks; performing a local dummy insertion to the approximate dummy region according to the local pattern density; repeating the identifying and performing to at least some other of the functional blocks; and implementing a global dummy insertion to a non-local dummy region according to a global pattern density.
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