Invention Grant
- Patent Title: Exposure apparatus and device manufacturing method
- Patent Title (中): 曝光装置和装置制造方法
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Application No.: US12566293Application Date: 2009-09-24
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Publication No.: US08373147B2Publication Date: 2013-02-12
- Inventor: Daisuke Itai , Kunitaka Ozawa
- Applicant: Daisuke Itai , Kunitaka Ozawa
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA, Inc., IP Division
- Priority: JP2008-248067 20080926
- Main IPC: G01N21/84
- IPC: G01N21/84 ; G06F17/00

Abstract:
An information processing apparatus, for processing information of a plurality of measured heights respectively corresponding to a plurality of measurement points on a surface of a substrate held by a chuck, includes a processor and an output device. The processor is configured to specify, with respect to the surface, a plurality of areas that are arrayed and a plurality of sections each constituted by a number of the plurality of areas, extract at least two inclinations of a plurality of inclinations respectively corresponding to the number of the plurality of areas based on the plurality of measured heights with respect to each of the plurality of sections, and cause the output device to output information specifying a section of the plurality of sections that satisfies a first condition that a product of two inclinations among the at least two inclinations exceeds a predetermined threshold.
Public/Granted literature
- US20100081096A1 EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-04-01
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