发明授权
- 专利标题: Method for fabricating porous silica preform
- 专利标题(中): 多孔二氧化硅预制件的制造方法
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申请号: US12630440申请日: 2009-12-03
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公开(公告)号: US08375749B2公开(公告)日: 2013-02-19
- 发明人: Kentaro Ichii , Takakazu Gotoh , Naritoshi Yamada , Koichi Harada
- 申请人: Kentaro Ichii , Takakazu Gotoh , Naritoshi Yamada , Koichi Harada
- 申请人地址: JP Tokyo
- 专利权人: Fujikura Ltd.
- 当前专利权人: Fujikura Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2003-381074 20031111; JP2003-391025 20031120
- 主分类号: C03B37/018
- IPC分类号: C03B37/018
摘要:
A method for fabricating a porous silica preform includes the steps of supplying fuel gas for generating an oxyhydrogen flame to a glass synthesizing burner; supplying Gas A containing silicon and Gas B containing fluorine to the burner; synthesizing glass particles; and depositing the glass particles around a starting rod, in which when glass particles are deposited directly on the starting rod, a supply of Gas A and a supply of Gas B supplied to the burner are adjusted so that a ratio of the number of fluorine atoms to the number of silicon atoms in the gas supplied to the burner satisfies the following Formula (1): {(number of F atoms)/(number of Si atoms)}≦0.1 (1).
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