发明授权
- 专利标题: Structure for recording medium
- 专利标题(中): 记录介质结构
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申请号: US13425676申请日: 2012-03-21
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公开(公告)号: US08377551B2公开(公告)日: 2013-02-19
- 发明人: Ryosuke Yamamoto , Hiroki Tanaka , Naoko Kihara , Toshiro Hiraoka
- 申请人: Ryosuke Yamamoto , Hiroki Tanaka , Naoko Kihara , Toshiro Hiraoka
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 代理机构: Nixon & Vanderhye, P.C.
- 主分类号: B32B7/06
- IPC分类号: B32B7/06 ; B32B18/00 ; B32B27/06 ; B32B33/00
摘要:
A structure includes a substrate, a first layer formed on the substrate, and a second layer formed on the first layer. The first layer is comprised of self-assembled monolayer and contains 4-(6-hydroxyhexyloxy)-4′-methoxybiphenyl. The second layer is obtained by micro-phase separation of a block copolymer containing a hydrophilic polymer comprised of polyethylene oxide and a hydrophobic polymer comprised of polymethacrylic acid containing azobenzene at the side chain. The second layer contains a cylinder phase with its long axis being oriented perpendicular to the substrate. The thickness T of the second layer is within a range of A≦T≦50 nm, where A is a phase separation period length satisfying 5 nm≦A≦50 nm.
公开/授权文献
- US20120231213A1 STRUCTURE 公开/授权日:2012-09-13
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