Invention Grant
- Patent Title: Negative working, heat-sensitive, lithographic printing plate precursor
- Patent Title (中): 负面工作，热敏平版印刷版前体
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Application No.: US12090679Application Date: 2006-04-04
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Publication No.: US08377628B2Publication Date: 2013-02-19
- Inventor: Pascal Meeus , Joan Vermeersch
- Applicant: Pascal Meeus , Joan Vermeersch
- Applicant Address: BE Mortsel
- Assignee: Agfa Graphics NV
- Current Assignee: Agfa Graphics NV
- Current Assignee Address: BE Mortsel
- Agency: Keating & Bennett, LLP
- Priority: EP05109781 20051020
- International Application: PCT/EP2006/061296 WO 20060404
- International Announcement: WO2007/045515 WO 20070426
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/26 ; B41N1/08
Abstract:
A heat-sensitive negative-working lithographic printing plate precursor includes on a grained and anodized aluminum support a coating including hydrophobic thermoplastic polymer particles, a hydrophilic binder, and an organic compound, wherein the organic compound includes at least one phosphonic acid group or at least one phosphoric acid group or a salt thereof.
Public/Granted literature
- US20080213696A1 Negative Working, Heat-Sensitive, Lithographic Printing Plate Precursor Public/Granted day:2008-09-04
Information query
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