发明授权
- 专利标题: Drawn dummy FeCAP, via and metal structures
- 专利标题(中): 绘制虚拟FeCAP,通孔和金属结构
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申请号: US13307829申请日: 2011-11-30
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公开(公告)号: US08377719B2公开(公告)日: 2013-02-19
- 发明人: Scott R. Summerfelt , Rajni J. Aggarwal
- 申请人: Scott R. Summerfelt , Rajni J. Aggarwal
- 申请人地址: US TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: US TX Dallas
- 代理商 Rose Alyssa Keagy; Wade J. Brady, III; Frederick J. Telecky, Jr.
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A process of forming an integrated circuit containing matching components with identical layouts and hydrogen permeable dummy vias in identical configurations over the matching components.
公开/授权文献
- US20120077287A1 DRAWN DUMMY FeCAP, VIA AND METAL STRUCTURES 公开/授权日:2012-03-29
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