发明授权
- 专利标题: Method for production of DDR type zeolite membrane
- 专利标题(中): 生产DDR型沸石膜的方法
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申请号: US12630169申请日: 2009-12-03
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公开(公告)号: US08377838B2公开(公告)日: 2013-02-19
- 发明人: Tetsuya Uchikawa , Kenji Yajima , Hisayoshi Nonaka , Toshihiro Tomita
- 申请人: Tetsuya Uchikawa , Kenji Yajima , Hisayoshi Nonaka , Toshihiro Tomita
- 申请人地址: JP Nagoya
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya
- 代理机构: Burr & Brown
- 优先权: JP2008-314100 20081210; JP2009-255809 20091109
- 主分类号: B01J29/06
- IPC分类号: B01J29/06 ; B01J20/28
摘要:
A method is provided for producing a DDR type zeolite membrane, including a membrane formation step of immersing a porous substrate having a DDR type zeolite seed crystal adhered thereon, in a raw material solution containing 1-adamantaneamine, silica (SiO2) and water, and conducting a hydrothermal synthesis of DDR type zeolite to form a 1-adamantaneamine-containing DDR type zeolite membrane on the porous substrate to produce a precursor of DDR type zeolite membrane-containing body, and a burning step of heating the precursor at 400° C. or above and at 550° C. or below to burn and remove the 1-adamantaneamine contained in the DDR type zeolite membrane.
公开/授权文献
- US20100144512A1 METHOD FOR PRODUCTION OF DDR TYPE ZEOLITE MEMBRANE 公开/授权日:2010-06-10
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