Invention Grant
- Patent Title: Method of forming wiring board and wiring board obtained
- Patent Title (中): 形成接线板和接线板的方法
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Application No.: US12585754Application Date: 2009-09-24
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Publication No.: US08378227B2Publication Date: 2013-02-19
- Inventor: Seiichi Inoue
- Applicant: Seiichi Inoue
- Applicant Address: JP Tokyo
- Assignee: Fujifilm Corporation
- Current Assignee: Fujifilm Corporation
- Current Assignee Address: JP Tokyo
- Agency: Edwards Neils PLLC
- Agent Jean C. Edwards, Esq.
- Priority: JP2008-252775 20080930
- Main IPC: H05K1/11
- IPC: H05K1/11

Abstract:
A method of forming a wiring board comprises: a step of forming a receptive layer having a porous structure on a substrate; a step of forming wiring portions in a desired conductive pattern on a surface of the receptive layer by ejecting a colloidal metal solution for drawing by an ink-jet system based on image date of the conductive pattern; and a step of performing a migration-proof treatment on at least part of the receptive layer exposed between mutually adjacent wiring portions.
Public/Granted literature
- US20100078208A1 Method of forming wiring board and wiring board obtained Public/Granted day:2010-04-01
Information query