Invention Grant
- Patent Title: Overvoltage protection device and its fabrication
- Patent Title (中): 过压保护装置及其制造
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Application No.: US13039782Application Date: 2011-03-03
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Publication No.: US08379356B2Publication Date: 2013-02-19
- Inventor: Jing-Rong Tang , Wen-Hsin Lin , Szu-Lung Sun
- Applicant: Jing-Rong Tang , Wen-Hsin Lin , Szu-Lung Sun
- Applicant Address: TW Taipei
- Assignee: Holy Stone Enterprise Co., Ltd.
- Current Assignee: Holy Stone Enterprise Co., Ltd.
- Current Assignee Address: TW Taipei
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Main IPC: H02H3/20
- IPC: H02H3/20 ; H02H9/04

Abstract:
An overvoltage protection device made by: employing a machining technique to make a through hole through opposing top and bottom walls of a substrate, and then filling an overvoltage protection material in the through hole of the substrate, and then curing the overvoltage protection material, and then coating a flat electrode on each of the top and bottom walls of the substrate over and in connection with top and bottom sides of the overvoltage protection material.
Public/Granted literature
- US20120224290A1 OVERVOLTAGE PROTECTION DEVICE AND ITS FABRICATION Public/Granted day:2012-09-06
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