发明授权
- 专利标题： Fluid filtration for substrate processing chamber
- 专利标题（中）： 衬底处理室的流体过滤
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申请号： US12914822申请日： 2010-10-28
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公开(公告)号： US08382885B2公开(公告)日： 2013-02-26
- 发明人: Dustin W. Ho , Juan Carlos Rocha-Alvarez , Hichem M'Saad
- 申请人： Dustin W. Ho , Juan Carlos Rocha-Alvarez , Hichem M'Saad
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Janah & Associates, P.C.
- 代理商 Ashok K. Janah
- 主分类号： B01D53/02
- IPC分类号： B01D53/02
摘要：
A filter for filtering a fluid in a substrate processing apparatus comprises first and second stages that are connected to one another. A delivery system provides a vaporized liquid to the filter. The first stage of the filter comprises a basic compound, and the second stage of the filter comprises a desiccant. A second filter comprises a permeation filter with permeable membrane to filter the fluid. Methods of filtering the fluid to reduce formation of undesirable process residues using the filter(s) are also described.
公开/授权文献
- US20110256041A1 FLUID FILTRATION FOR SUBSTRATE PROCESSING CHAMBER 公开/授权日：2011-10-20
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