Invention Grant
- Patent Title: Fluid filtration for substrate processing chamber
- Patent Title (中): 衬底处理室的流体过滤
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Application No.: US12914822Application Date: 2010-10-28
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Publication No.: US08382885B2Publication Date: 2013-02-26
- Inventor: Dustin W. Ho , Juan Carlos Rocha-Alvarez , Hichem M'Saad
- Applicant: Dustin W. Ho , Juan Carlos Rocha-Alvarez , Hichem M'Saad
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Janah & Associates, P.C.
- Agent Ashok K. Janah
- Main IPC: B01D53/02
- IPC: B01D53/02

Abstract:
A filter for filtering a fluid in a substrate processing apparatus comprises first and second stages that are connected to one another. A delivery system provides a vaporized liquid to the filter. The first stage of the filter comprises a basic compound, and the second stage of the filter comprises a desiccant. A second filter comprises a permeation filter with permeable membrane to filter the fluid. Methods of filtering the fluid to reduce formation of undesirable process residues using the filter(s) are also described.
Public/Granted literature
- US20110256041A1 FLUID FILTRATION FOR SUBSTRATE PROCESSING CHAMBER Public/Granted day:2011-10-20
Information query
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