Invention Grant
- Patent Title: InGaAIN light-emitting device and manufacturing method thereof
- Patent Title (中): InGaAIN发光器件及其制造方法
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Application No.: US11915304Application Date: 2006-05-26
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Publication No.: US08384100B2Publication Date: 2013-02-26
- Inventor: Fengyi Jiang , Li Wang , Chuanbing Xiong , Wenqing Fang , Hechu Liu , Maoxing Zhou
- Applicant: Fengyi Jiang , Li Wang , Chuanbing Xiong , Wenqing Fang , Hechu Liu , Maoxing Zhou
- Applicant Address: CN Nanchang
- Assignee: Lattice Power (JIANGXI) Corporation
- Current Assignee: Lattice Power (JIANGXI) Corporation
- Current Assignee Address: CN Nanchang
- Agency: Park, Vaughan, Fleming & Dowler LLP
- Agent Shun Yao
- Priority: CN200510026306 20050527
- International Application: PCT/CN2006/001100 WO 20060526
- International Announcement: WO2006/125396 WO 20061130
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
There is provided an InGaAlN light-emitting device and a manufacturing method thereof. The light emitting device includes a conductive substrate having a main surface and a back surface, a metal bonding layer formed on the main surface of the substrate, a light reflecting layer formed on the bonding layer, a semiconductor multilayer structure including at least a p-type and an n-type InGaAlN layer disposed on the reflecting layer, the p-type InGaAlN layer directly contacting the reflecting layer, and ohmic electrodes disposed on said n-type InGaAlN layer and on the back surface of the conductive substrate, respectively.
Public/Granted literature
- US20090026473A1 InGaAlN LIGHT-EMITTING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2009-01-29
Information query
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