发明授权
US08389593B2 Composition for simultaneously forming two isolated column spacer patterns 有权
用于同时形成两个隔离柱间隔图案的组合物

Composition for simultaneously forming two isolated column spacer patterns
摘要:
A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
信息查询
0/0