发明授权
US08389593B2 Composition for simultaneously forming two isolated column spacer patterns
有权
用于同时形成两个隔离柱间隔图案的组合物
- 专利标题: Composition for simultaneously forming two isolated column spacer patterns
- 专利标题(中): 用于同时形成两个隔离柱间隔图案的组合物
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申请号: US12654583申请日: 2009-12-23
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公开(公告)号: US08389593B2公开(公告)日: 2013-03-05
- 发明人: Chang Ho Cho , Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
- 申请人: Chang Ho Cho , Keon Woo Lee , Sung Hyun Kim , Sang Kyu Kwak , Dong Kung Oh , Chang Soon Lee
- 申请人地址: KR Seoul
- 专利权人: LG Chem, Ltd.
- 当前专利权人: LG Chem, Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge LLP
- 优先权: KR10-2008-0133739 20081224; KR10-2009-0121019 20091208
- 主分类号: B29C71/04
- IPC分类号: B29C71/04 ; A61L2/08 ; G03F7/00
摘要:
A composition for forming column spacers is provided. The composition comprises a radical polymerization inhibitor. The use of the composition enables simultaneous formation of a saturated pattern and a semi-transmissive pattern as column spacer patterns having different shapes, whose difference in thickness is controllable as desired although the sensitivity is slightly reduced, through a slit or semi-transmissive mask by varying the kind and amount of the radical polymerization inhibitor. Further provided are column spacers formed using composition and a liquid crystal display using the column spacers.
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