发明授权
US08389755B2 Gas adsorption material, precursor of same, and method of producing gas adsorption material
有权
气体吸附材料,前体相同,以及生产气体吸附材料的方法
- 专利标题: Gas adsorption material, precursor of same, and method of producing gas adsorption material
- 专利标题(中): 气体吸附材料,前体相同,以及生产气体吸附材料的方法
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申请号: US13074353申请日: 2011-03-29
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公开(公告)号: US08389755B2公开(公告)日: 2013-03-05
- 发明人: Masahiro Furukawa , Masashi Goto
- 申请人: Masahiro Furukawa , Masashi Goto
- 申请人地址: JP Nagoya
- 专利权人: NGK Insulators, Ltd.
- 当前专利权人: NGK Insulators, Ltd.
- 当前专利权人地址: JP Nagoya
- 代理机构: Burr & Brown
- 优先权: JP2008-250964 20080929
- 主分类号: C07F13/00
- IPC分类号: C07F13/00 ; C07F1/00 ; C07F3/00 ; C07F15/00
摘要:
A gas adsorption material has a three-dimensional structure wherein a ligand (p-hydroxybenzoic acid) having an aromatic ring as a principal skeleton containing, a carboxyl group and a functional group capable of forming a coordinate bond, the functional group being other than the carboxyl group, and a metal nucleus (Zn) are bonded to each other at a ratio of 1:1. The ligand contains a functional hydroxyl group other than the carboxyl group, and the carboxyl group and the functional group other than the carboxyl group are bonded in at least one position to the metal nucleus. The gas adsorption material is produced by drying a precursor obtained by reacting the ligand and the metal nucleus, dissolving the dried precursor in an organic solvent, heating and stirring a resultant solution to form a three-dimensional structure that includes the organic solvent as a crystal solvent, and removing the crystal solvent.