发明授权
- 专利标题: Formulations for environmentally friendly photoresist film layers
- 专利标题(中): 环保光致抗蚀剂膜层的配方
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申请号: US12894930申请日: 2010-09-30
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公开(公告)号: US08394575B2公开(公告)日: 2013-03-12
- 发明人: Xiaoming Wu , David Graham , Sean Weaver , Bart Mansdorf , Rich Wells , Joel Provence
- 申请人: Xiaoming Wu , David Graham , Sean Weaver , Bart Mansdorf , Rich Wells , Joel Provence
- 申请人地址: US KY Lexington
- 专利权人: Lexmark International, Inc.
- 当前专利权人: Lexmark International, Inc.
- 当前专利权人地址: US KY Lexington
- 主分类号: G03F7/004
- IPC分类号: G03F7/004
摘要:
Environmentally friendly thick film layers for a micro-fluid ejection head and micro-fluid ejection heads are disclosed. The environmentally friendly thick film layer includes a negative photoresist layer derived from a composition comprising a multi-functional epoxy compound, a low molecular weight polymeric difunctional epoxy compound, a monomeric difunctional epoxy compound, a methide-based photoacid generator that does not contain antimony, a chromophore and an aryl ketone solvent. Optionally the photoresist layer contains an adhesion enhancer. The negative photoresist layer is environmentally friendly and provides good resolution, well defined critical dimensions, straight side walls, and a large processing window.