发明授权
US08395228B2 Integration process to improve focus leveling within a lot process variation
有权
整合过程可以在很多过程变化中提高焦点调平
- 专利标题： Integration process to improve focus leveling within a lot process variation
- 专利标题（中）： 整合过程可以在很多过程变化中提高焦点调平
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申请号： US12941375申请日： 2010-11-08
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公开(公告)号： US08395228B2公开(公告)日： 2013-03-12
- 发明人: Wai-Kin Li , Wu-Song Huang , Dario Leonardo Goldfarb , Martin Glodde , Edward Engbrecht , Yiheng Xu
- 申请人： Wai-Kin Li , Wu-Song Huang , Dario Leonardo Goldfarb , Martin Glodde , Edward Engbrecht , Yiheng Xu
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Catherine Ivers Wenjie Li
- 代理商 Ira D. Blecker
- 主分类号： H01L21/02
- IPC分类号： H01L21/02
摘要：
A method of improving the focus leveling response of a semiconductor wafer is described. The method includes combining organic and inorganic or metallic near infrared (NIR) hardmask on a semiconductor substrate; forming an anti-reflective coating (ARC) layer on the combined organic NIR-absorption and the inorganic or metallic NIR-absorption hardmask; and forming a photoresist layer on the ARC layer. A semiconductor structure is also described including a substrate, a resist layer located over the structure; and an absorptive layer located over the substrate. The absorptive layer includes an inorganic or metallic NIR-absorbing hardmask layer.